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Optical Flatness Critical Glass Disc Substrates for Thin-Film Deposition

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Optical Flatness Critical Glass Disc Substrates for Thin-Film Deposition

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Brand Name :LONGWAY
Model Number :YY22353312
Certification :ISO9001
Place of Origin :China
MOQ :500 pieces
Price :NEGOTIATION
Payment Terms :D/P,T/T,Western Union
Supply Ability :90000 Pieces per Month
Packaging Details :electrolytic capacitor paper,foam,carton
Surface :Optical grade
Transmission :>90 %
Coating :Available
Processing :Polishing
Application :Optics and Laser
OEM :Available
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Optical Flatness Critical Glass Disc Substrates for Thin-Film Deposition


Material

  • High-Purity Glass: Typically made from fused silica (JGS1/JGS2), borosilicate, or quartz, selected for ultra-low thermal expansion and chemical inertness.

    • Fused Silica: Preferred for its exceptional homogeneity, low OH content, and resistance to thermal shock.

    • Borosilicate: Cost-effective alternative with moderate thermal stability and good surface polishability.

  • Surface Quality: Engineered with λ/10 to λ/20 flatness to ensure minimal deviation for precision coatings.

Key Properties

  1. Optical Flatness: Surface flatness ≤ λ/10 (at 632.8 nm), critical for uniform thin-film deposition and minimizing wavefront distortion.

  2. Thermal Stability: Low coefficient of thermal expansion (e.g., 0.55 x 10⁻⁶/°C for fused silica) prevents deformation during high-temperature processes like CVD or sputtering.

  3. Chemical Resistance: Inert to acids, plasmas, and solvents, ensuring durability in aggressive deposition environments.

  4. Surface Homogeneity: Refractive index uniformity (±5 x 10⁻⁶) avoids optical distortions in coated films.

  5. Mechanical Durability: High hardness (Mohs 5–7) resists scratching during handling and processing.

Function

  • Thin-Film Substrate: Provides an ultra-flat, stable base for depositing coatings (anti-reflective, dielectric, metallic).

  • Process Compatibility: Compatible with PVD, CVD, ALD, and sputtering techniques, ensuring uniform film adhesion and thickness.

  • Metrology Reference: Serves as a calibration standard for interferometers and surface profilers due to precise flatness.

Applications

  • Semiconductor Manufacturing: Photomasks, EUV lithography mirrors, and optical MEMS devices.

  • Optics Industry: Coated filters, beam splitters, and laser optics requiring nanometer-level precision.

  • Research & Development: Nanotechnology, photonics, and quantum computing experiments.

  • Aerospace & Defense: Precision sensors, satellite optics, and laser guidance systems.

  • Medical Devices: Optical coatings for imaging systems, endoscopes, and diagnostic equipment.

Name Glass disc, Glass wafer, Glass substrate, Sight glass

ofloat
Diameter Tolerance +0/-0.2 mm
Thickness Tolerance +/-0.2 mm
Processed By Cutting,Grinding, Polishing
Working temperature Resisting high temperature shock
Surface Quality 80/50,60/40,40/20
Material Quality No scratches and air bubble
Transmission >90% for visible light
Chamfer 0.1-0.5 mm x 45 degree
Surface Coating Available
Usage Photography, Lighting system, industrial area.


Optical Flatness Critical Glass Disc Substrates for Thin-Film Deposition

Optical Flatness Critical Glass Disc Substrates for Thin-Film Deposition

Optical Flatness Critical Glass Disc Substrates for Thin-Film Deposition




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