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UV Fused Silica Glass Discs for Precision Optics & Laser Systems
Material
UV Fused Silica: Synthetic glass composed of high-purity silicon dioxide (SiO₂), optimized for ultraviolet (UV) transmission.
Grades: Includes JGS1 (deep UV transparency, 185–2500 nm) and JGS2 (220–2500 nm), balancing performance and cost.
Purity: Low metallic impurities and hydroxyl (OH) content ensure minimal absorption in UV spectrum.
Key Properties
UV Transparency: Exceptional transmission from deep UV to near-infrared (NIR), critical for UV laser applications.
Thermal Stability: Low thermal expansion (≈0.55 x 10⁻⁶/°C) resists deformation under high-power laser exposure or temperature shifts.
Chemical Resistance: Inert to acids, solvents, and plasmas, ideal for harsh industrial environments.
Laser Damage Threshold: High resistance to laser-induced damage, suitable for pulsed and continuous-wave lasers.
Surface Quality: Polished to λ/10 flatness with minimal subsurface defects, ensuring precision beam control.
Homogeneity: Uniform refractive index (±5 x 10⁻⁶) for distortion-free optics.
Function
Optical Windows: Transmit UV light while protecting sensitive components from environmental factors.
Substrates: Serve as bases for coatings (anti-reflective, dielectric) in mirrors, filters, or beam splitters.
Beam Delivery: Maintain beam integrity in laser cavities, collimators, and focusing systems.
Optical Flats: Provide reference surfaces for interferometry and calibration.
Applications
Laser Systems: UV excimer lasers, Nd:YAG systems, and femtosecond lasers for beam guidance and output windows.
Semiconductor Lithography: UV light delivery in photolithography masks and stepper systems.
Precision Optics: Telescope mirrors, microscope slides, and interferometer components.
Medical Devices: UV sterilization equipment, laser surgery tools, and diagnostic imaging.
Aerospace & Defense: UV sensors, LIDAR systems, and high-energy laser (HEL) applications.
Research: Spectroscopy, UV photonics, and quantum optics experiments.
Name | Glass disc, Glass wafer |
Material | Optical glass, Qurartz glass, Pyrex, borosilicate glass, Float glass, borofloat |
Diameter Tolerance | +0/-0.2 mm |
Thickness Tolerance | +/-0.2 mm |
Processed | By Cutting,Grinding,Tempering, Polishing |
Working temperature | Resisting high temperature shock |
Surface Quality | 80/50,60/40,40/20 |
Material Quality | No scratches and air bubble |
Transmission | >92% for visible light |
Chamfer | 0.1-0.3 mm x 45 degree |
Surface Coating | Available |
Usage | Photography, Lighting system, industrial area. |